7inch sputtering system / 증착 챔버
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- 도입년도
- 2006
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- 모델명
- 모델명 없음
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- 취득금액
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- 제조국가 / 제조사
- 대한민국 / 에스엔텍
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- 수량
- 1
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- 운영기관
- 정보통신용신기능성소재및공정연구센터
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- 설치장소
- [81401]나노공정팹
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- 담당자 연락처 / e-mail
- 031-299-6608 / angolmois@skku.edu
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구성 및 성능
닫기* Processing Chamber - Material : SUS 304L - Inner Dimension : 제작사에서 결정 - CF2.75" Gauge & Spare : 5 ea - Single Thickness walled fitted with pipes for cooling all of stainless steel - Chamber Stainless steel shields glass bead blasted for coating protection : 2 set - All of stainless steel electro-polished * Magnetron sputter source - Magnetron rotation type : 3ea * DC Power supply : 2 set - Brand : Advanced Energy in USA - Capacity : 2 KW - Selective processing & including the power switching module - Power Current Voltage mode available - Switching type - Remote type * Performance specification (Processing chamber) - Sample size : Piece to Max. 8 inch - Target composition : Various Metal & Dielectrics - Film thickness Uniformity : < ± 5 % in 6 inch area (min-max) - Ultimate pressure : < 3×10-7 Torr with 3 hours n case of initial pumping - Heating real temp. : Max. 300±3 ℃ - Warranty period : 1 year after installation(except the consumable parts).
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